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Proceedings Paper

Dose control for short exposures in excimer laser lithography
Author(s): Richard F. Hollman
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Paper Details

Date Published: 1 March 1991
PDF: 7 pages
Proc. SPIE 1377, Excimer Laser Materials Processing and Beam Delivery Systems, (1 March 1991); doi: 10.1117/12.25033
Show Author Affiliations
Richard F. Hollman, GCA Corp. (United States)


Published in SPIE Proceedings Vol. 1377:
Excimer Laser Materials Processing and Beam Delivery Systems
Bernhard P. Piwczyk, Editor(s)

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