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Proceedings Paper

Dose control for short exposures in excimer laser lithography
Author(s): Richard F. Hollman
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Paper Abstract

As a result of progress in deep UV resists lasers and optics exposures well below 50 pulses are becoming routine. To maintain the degree of dose control required for linewidth control some means of pulse energy modulation is necessary during the course of an exposure. It is possible to achieve 1 dose control for exposures using as few as 6 pulses by relatively simple means. This paper will present a statistical analysis of some dose control methods along with some results of the application of energy modulation in excimer laser steppers.

Paper Details

Date Published: 1 March 1991
PDF: 7 pages
Proc. SPIE 1377, Excimer Laser Materials Processing and Beam Delivery Systems, (1 March 1991); doi: 10.1117/12.25033
Show Author Affiliations
Richard F. Hollman, GCA Corp. (United States)


Published in SPIE Proceedings Vol. 1377:
Excimer Laser Materials Processing and Beam Delivery Systems
Bernhard P. Piwczyk, Editor(s)

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