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Proceedings Paper

In-situ measurement of outgassing generated from EUV metal oxide nanoparticles resist during electron irradiation
Author(s): Y. Minami; S. Takahashi; H. Minami; Y. Matsumoto; M. Kadoi; A. Sekiguchi; T. Watanabe
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Paper Abstract

In this study, we prepared the EUV metal resist, which included ZrO2 nano-particle and three type of ligands such as 2-propenoic acid 2-methyl (MAA), propanoic acid 2-methyl (IBA) and vinylbenzoic acid (VBA). In this study, we prepared the following resists by blending each material separately for evaluating the outgassing from the view point of EUV resist materials. We prepared three type of samples on a basis of ZrO2-MAA, ZrO2-IBA and ZrO2-VBA, each resist was coated on a silicon wafer, and we evaluated the outgassing from these samples during irradiation of 2 keV electron by in-situ mass spectrometry. From the results of mass spectrum, we observed the outgassing of PAG as unique peaks. And each ligand peak was distributed over the low mass range. On the other hand, the ZrO2 peaks could not be observe in mass spectrum of each sample. Thus, ZrO2 nano-particles might not be evaporating during 2keV electron irradiation.

Paper Details

Date Published: 3 October 2018
PDF: 6 pages
Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108091W (3 October 2018); doi: 10.1117/12.2503255
Show Author Affiliations
Y. Minami, Litho Tech Japan Corp. (Japan)
S. Takahashi, Litho Tech Japan Corp. (Japan)
H. Minami, Litho Tech Japan Corp. (Japan)
Y. Matsumoto, Litho Tech Japan Corp. (Japan)
M. Kadoi, Litho Tech Japan Corp. (Japan)
A. Sekiguchi, Litho Tech Japan Corp. (Japan)
T. Watanabe, Univ. of Hyogo (Japan)


Published in SPIE Proceedings Vol. 10809:
International Conference on Extreme Ultraviolet Lithography 2018
Kurt G. Ronse; Eric Hendrickx; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani, Editor(s)

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