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Proceedings Paper

A possible wafer heating during EUV exposure
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Paper Abstract

Extreme ultraviolet (EUV) lithography is the most promising candidate for sub-1x nm pattering. CO2 laser irradiates to a Sn droplet and then, EUV radiation can be emitted. In this process, infrared radiation (IR) is simultaneously emitted 3 to 5 times more than EUV radiation. In order to suppress IR, spectral purity filter (SPF) [8] at collector mirror and dynamic gas lock (DGL) [4] are used. Nevertheless, some amount of IR still reaches to the wafer and it can lead to wafer heating issue, so that we investigated temperature and deformation of the wafer by using finite element method (FEM) simulation. Two different silicon wafer types are compared. There is a difference in temperature and deformation between single layered wafer with and without the bottom chuck. We also found that the temperature increased more with added stacks like hard mask or photoresist on the top of the wafer.

Paper Details

Date Published: 11 October 2018
PDF: 8 pages
Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108091R (11 October 2018); doi: 10.1117/12.2502918
Show Author Affiliations
Se-Hun Oh, Hanyang Univ. (Korea, Republic of)
Sung-Gyu Lee, Hanyang Univ. (Korea, Republic of)
Jae-Hun Park, Hanyang Univ. (Korea, Republic of)
Chung-Hyun Ban, Hanyang Univ. (Korea, Republic of)
Hye-Keun Oh, Hanyang Univ. (Korea, Republic of)


Published in SPIE Proceedings Vol. 10809:
International Conference on Extreme Ultraviolet Lithography 2018
Kurt G. Ronse; Eric Hendrickx; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani, Editor(s)

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