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Proceedings Paper

High-NA EUV lithography exposure tool progress (Conference Presentation)
Author(s): Jan van Schoot; Eelco van Setten; Kars Troost; Frank Bornebroek; Rob van Ballegoij; Sjoerd Lok; Judon Stoeldraijer; Jo Finders; Hans Meiling; Paul Graeupner; Peter Kuerz; Winfried Kaiser; Erik Loopstra; Bernhard Kneer; Sascha Migura
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Paper Abstract

While EUV systems equipped with a 0.33 Numerical Aperture (NA) lens are readying to start high volume manufacturing, ASML and Zeiss are in parallel ramping up their activities on an EUV exposure tool with an NA of 0.55. The purpose of this high-NA scanner, targeting an ultimate resolution of 8nm, is to extend Moore’s law throughout the next decade. A novel lens design, capable of providing the required Numerical Aperture, has been identified; this lens will be paired with new, faster stages and more accurate sensors enabling the tight focus and overlay control needed for future process nodes. In this paper an update will be given on the status of the developments at Carl Zeiss and ASML. Next to this, we will address several topics inherent in the new design and smaller target resolution: M3D effects, polarization, focus control and stitching.

Paper Details

Date Published: 12 October 2018
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Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108090Z (12 October 2018); doi: 10.1117/12.2502894
Show Author Affiliations
Jan van Schoot, ASML Netherlands B.V. (Netherlands)
Eelco van Setten, ASML Netherlands B.V. (Netherlands)
Kars Troost, ASML Netherlands B.V. (Netherlands)
Frank Bornebroek, ASML Netherlands B.V. (Netherlands)
Rob van Ballegoij, ASML Netherlands B.V. (Netherlands)
Sjoerd Lok, ASML Netherlands B.V. (Netherlands)
Judon Stoeldraijer, ASML Netherlands B.V. (Netherlands)
Jo Finders, ASML Netherlands B.V. (Netherlands)
Hans Meiling, ASML Netherlands B.V. (Netherlands)
Paul Graeupner, Carl Zeiss SMT GmbH (Germany)
Peter Kuerz, Carl Zeiss SMT GmbH (Germany)
Winfried Kaiser, Carl Zeiss SMT GmbH (Germany)
Erik Loopstra, Carl Zeiss SMT GmbH (Germany)
Bernhard Kneer, Carl Zeiss SMT GmbH (Germany)
Sascha Migura, Carl Zeiss SMT GmbH (Germany)


Published in SPIE Proceedings Vol. 10809:
International Conference on Extreme Ultraviolet Lithography 2018
Kurt G. Ronse; Eric Hendrickx; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani, Editor(s)

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