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Proceedings Paper

NXE:3400B EUV source performance in the field, readiness for HVM and power scaling beyond 250W
Author(s): Igor V. Fomenkov; Michael A. Purvis; Alexander A. Schafgans; Yezheng Tao; Slava Rokitski; Jayson Stewart; Andrew LaForge; Alexander I. Ershov; Robert J. Rafac; Silvia De Dea; Chirag Rajyaguru; Georgiy O. Vaschenko; Mathew Abraham; David C. Brandt; Daniel J. Brown
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Paper Abstract

We provide an overview of laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source performance to enable high volume manufacturing and improvements in various technologies for scaling output power of the source. Several companies have multiple systems and are ramping toward production, we will show current output and availability of sources and describe their readiness for HVM. We will show improvements to source architecture that facilitated the increase of EUV power to 250W, and the technical challenges for power scaling of key source parameters and subsystems. The performance of critical subsystems such as the Droplet Generator and Collector protection will be shown, with emphasis on stability and lifetime. Finally, we will describe current research activities and provide a perspective for LPP EUV sources towards 500W.

Paper Details

Date Published: 3 October 2018
PDF: 1 pages
Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108091L (3 October 2018); doi: 10.1117/12.2502801
Show Author Affiliations
Igor V. Fomenkov, ASML US, LLC (United States)
Michael A. Purvis, ASML US, LLC (United States)
Alexander A. Schafgans, ASML US, LLC (United States)
Yezheng Tao, ASML US, LLC (United States)
Slava Rokitski, ASML US, LLC (United States)
Jayson Stewart, ASML US, LLC (United States)
Andrew LaForge, ASML US, LLC (United States)
Alexander I. Ershov, ASML US, LLC (United States)
Robert J. Rafac, ASML US, LLC (United States)
Silvia De Dea, ASML US, LLC (United States)
Chirag Rajyaguru, ASML US, LLC (United States)
Georgiy O. Vaschenko, ASML US, LLC (United States)
Mathew Abraham, ASML US, LLC (United States)
David C. Brandt, ASML US, LLC (United States)
Daniel J. Brown, ASML US, LLC (United States)


Published in SPIE Proceedings Vol. 10809:
International Conference on Extreme Ultraviolet Lithography 2018
Kurt G. Ronse; Eric Hendrickx; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani, Editor(s)

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