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Using resonant soft x-ray scattering to image patterns on undeveloped resists
Author(s): Guillaume Freychet; Isvar A. Cordova; Terry McAfee; Dinesh Kumar; Ronald J. Pandolfi; Chris Anderson; Patrick Naulleau; Cheng Wang; Alexander Hexemer
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Paper Abstract

Extreme ultraviolet lithography is one of the most promising printing techniques for high volume semiconductor manufacturing at the 14 nm half-pitch device node and beyond. However, key challenges around EUV photoresist materials such as the exposure-dose sensitivity or the line-width roughness continue to impede the full adoption into industrial nanofab facilities. New metrology tools are required to address these challenges by helping to determine the impact of the EUV materials’ properties and processing conditions on the roughness through the different step of the process. Here, we apply the resonant soft x-ray scattering (RSOXS) technique to gain insights into the structure of patterned EUV resists before the development step takes place. By using energies around the carbon absorption edge to take advantage of small differences in chemistry, the electronic density contrast between the exposed and unexposed regions of the resists could be enhanced in order to image the patterns with sub-nm precision. Critical-dimension grazing incidence small-angle X-ray scattering (CDGISAXS) was then performed at energies where the contrast was maximized, enabling the reconstruction of the 3D shape of the latent image. This demonstrates the potential of RSOXS to provide a high-resolution heightsensitive profile of patterned EUV resists, which will help to quantify the evolution of critical features, such as the line edge roughness, at each step of the nanofabrication process.

Paper Details

Date Published: 9 October 2018
PDF: 8 pages
Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108090V (9 October 2018); doi: 10.1117/12.2502769
Show Author Affiliations
Guillaume Freychet, Lawrence Berkeley National Lab. (United States)
Isvar A. Cordova, Lawrence Berkeley National Lab. (United States)
Terry McAfee, Lawrence Berkeley National Lab. (United States)
Washington State Univ. (United States)
Dinesh Kumar, Lawrence Berkeley National Lab. (United States)
Ronald J. Pandolfi, Lawrence Berkeley National Lab. (United States)
Chris Anderson, Lawrence Berkeley National Lab. (United States)
Patrick Naulleau, Lawrence Berkeley National Lab. (United States)
Cheng Wang, Lawrence Berkeley National Lab. (United States)
Alexander Hexemer, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 10809:
International Conference on Extreme Ultraviolet Lithography 2018
Kurt G. Ronse; Eric Hendrickx; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani, Editor(s)

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