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Analysis of bottleneck factors affecting precision manufacturing and possible solutions
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Paper Abstract

At present, the Nano Scale Precision (NSP) has not been achieved at an enough satisfactory level yet which is required highly on measuring, processing and fabrication arts of semiconductor and integrated circuit chips. The applications are also found in such as the lithography machines of high resolution, fine optical film, lens processing and so on. The main negative factors that effect the NSP improvement can be summarized as follows: the perturbance from the surrounding atmosphere, the random vibration from the supporting structure, the temperature drift, the dust particles, the humidity and the error transfer within the system. In this paper, the factors that blocking the improvement of high-precision manufacturing industries are analyzed. Specially, a method used in setting up a higher stability vibration-resistant platform without air cushion and mechanical pump power source is proposed. The basic solution of digital process used for measuring the disturbance surrounded the system is introduced.

Paper Details

Date Published: 25 October 2018
PDF: 7 pages
Proc. SPIE 10823, Nanophotonics and Micro/Nano Optics IV, 108230J (25 October 2018); doi: 10.1117/12.2502742
Show Author Affiliations
Hongyi Gao, Shanghai Institute of Optics and Fine Mechanics (China)
Ruxin Li, Shanghai Institute of Optics and Fine Mechanics (China)
Zhizhan Xu, Shanghai Institute of Optics and Fine Mechanics (China)
Zuguo Cheng, Tongji Univ. (China)


Published in SPIE Proceedings Vol. 10823:
Nanophotonics and Micro/Nano Optics IV
Zhiping Zhou; Kazumi Wada, Editor(s)

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