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An optical power supply scheme for ultrahigh voltage grid with high reliability
Author(s): Pu Wei; Shenting Lu; Hui Huang; Lu Deng; Jing Zhao
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Paper Abstract

The optical power supply technology has been presented several years and used in Electric current transformer (ECT). However, the reliability of the technology is proved to be low in actual application, which limit its widely used in electric power industry. In this paper, we propose a novel optical power supply system for Ultra-High Voltage (UHV) Grid, which utilizes 810-nm laser diode in low-voltage (LV) environment and GaAs photocell for power supply in highvoltage (HV) environment. A Lithium battery is further employed in HV environment which makes the power supply scheme more flexible and reliable. In addition, two VCSELs are also used for information transmission between the LV and the HV environment. And the parameters of the system, such as load power, laser driving current, laser temperature, semiconductor chilling plate driving current, ambient temperature and ambient humidity, are collected, transmitted via optical fiber and processed by the power management scheme. The scheme is able to dynamically control the output power of the laser diode according to the load power variance and make the Lithium battery working when the optical power supply is unavailable or burst heavy power supply demand is emerged. In this way, the output power variance of the laser can be kept as low as possible, which effectively increase the reliability of the system.

Paper Details

Date Published: 6 November 2018
PDF: 6 pages
Proc. SPIE 10812, Semiconductor Lasers and Applications VIII, 108121A (6 November 2018); doi: 10.1117/12.2502304
Show Author Affiliations
Pu Wei, Nanjing Institute of Technology (China)
Shenting Lu, Nanjing Institute of Technology (China)
Hui Huang, State Grid Corp. of China (China)
Lu Deng, NARI Group Corp. (China)
Jing Zhao, Nanjing Institute of Technology (China)


Published in SPIE Proceedings Vol. 10812:
Semiconductor Lasers and Applications VIII
Ning Hua Zhu; Werner H. Hofmann, Editor(s)

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