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Three-dimensional flattop focal spot generation using vectorial optical fields (Conference Presentation)
Author(s): Elforjani Jera; Sichao Zhou; Qiwen Zhan

Paper Abstract

We have demonstrated a new approach of focal field engineering that generates a three-dimensional diffraction limited focal spot with flattop and uniform intensity structure. The required input field at the pupil plane of 4pi microscope objectives to generate the desired focal field is analytically calculated by collecting the radiations of electric and magnetic dipoles oscillating at the focal point with an appropriate orientation. By using the input field at the pupil plane as an illumination source to the system and reversing the propagation, focusing the input field leads to the desired focal spot in the focal volume. The designed three-dimensional flattop focal spot is diffraction limited and possesses a uniform and smooth intensity distribution over a cross section area of 0.725λ diameter and FWHM=0.9625λ. This kind of focal fields is required by many optical applications, such as, nanofabrication, laser machining, particle trapping and acceleration, and many more. Keywords: 4pi microscope, focal field, polarization, laser beam shaping, diffraction theory

Paper Details

Date Published: 8 March 2019
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Proc. SPIE 10935, Complex Light and Optical Forces XIII, 109350R (8 March 2019); doi: 10.1117/12.2502186
Show Author Affiliations
Elforjani Jera, Univ. of Dayton (United States)
Sichao Zhou, Univ. of Dayton (United States)
Qiwen Zhan, Univ. of Dayton (United States)


Published in SPIE Proceedings Vol. 10935:
Complex Light and Optical Forces XIII
Jesper Glückstad; David L. Andrews; Enrique J. Galvez, Editor(s)

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