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Proceedings Paper

Dry etching technologies for Cr film
Author(s): Kei Hattori; Takashi Miyamoto; Yoshinori Iino; Shunpei Kodama; Yoshie Okamoto; Kazuki Nakazawa; Makoto Karyu; Hideaki Terakado; Hiroki Shirahama; Hirotsugu Ita; Tomoaki Yoshimori; Hidehito Azumano; Makoto Muto; Mumenori Iwami
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Paper Abstract

We have investigated Cr film etching mechanism systematically in order to minimize CDU (CD Uniformity). As a result, employing our dry etching system ARESTM with optimized etch process we achieved an excellent CDU(3σ) (0.5nm with etch contribution). Cr film has been widely used not only for the light-shielding film at Cr Binary Mask but also as a hard mask film at even the leading edge photomasks (Hard Mask-PSM (Phase Shift Mask)). In case of used as a hard-mask, this plays very important role to determine etching process accuracy and to achieve the minimal CDU. As LSI downscaling and complication of their pattern layouts, the current dry etch technology faces technical challenges such as the difficulties in CD control and will be not sufficient to meet requirements. In this study, each behavior of Cr etching process at the various process parameters and various pattern layouts are investigated.

Paper Details

Date Published: 12 June 2018
PDF: 6 pages
Proc. SPIE 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology, 1080708 (12 June 2018); doi: 10.1117/12.2502053
Show Author Affiliations
Kei Hattori, Shibaura Mechatronics Corp. (Japan)
Takashi Miyamoto, Shibaura Mechatronics Corp. (Japan)
Yoshinori Iino, Shibaura Technology International Corp. (United States)
Shunpei Kodama, Shibaura Mechatronics Corp. (Japan)
Yoshie Okamoto, Shibaura Mechatronics Corp. (Japan)
Kazuki Nakazawa, Shibaura Mechatronics Corp. (Japan)
Makoto Karyu, Shibaura Mechatronics Corp. (Japan)
Hideaki Terakado, Shibaura Technology International Corp. (United States)
Hiroki Shirahama, Shibaura Mechatronics Corp. (Japan)
Hirotsugu Ita, Shibaura Mechatronics Corp. (Japan)
Tomoaki Yoshimori, Shibaura Mechatronics Corp. (Japan)
Hidehito Azumano, Shibaura Mechatronics Corp. (Japan)
Makoto Muto, Shibaura Mechatronics Corp. (Japan)
Mumenori Iwami, Shibaura Mechatronics Corp. (Japan)


Published in SPIE Proceedings Vol. 10807:
Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
Kiwamu Takehisa, Editor(s)

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