Share Email Print
cover

Proceedings Paper

Lateral shearing interferometry for high-NA EUV wavefront metrology
Author(s): Wenhua Zhu; Ryan Miyakawa; Lei Chen; Patrick Naulleau
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We present a lateral shearing interferometer suitable for high-NA EUV wavefront metrology. In this interferometer, a geometric model is used to accurately characterize and predict systematic errors that come from performing interferometry at high NA. This interferometer is compatible with various optical geometries, including systems where the image plane is tilted with respect to the optical axis, as in the Berkeley MET5. Simulation results show that the systematic errors in tilted geometries can be reduced by aligning the shearing interferometer grating and detector parallel to the image plane. Subsequent residual errors can be removed by linear fitting.

Paper Details

Date Published: 9 October 2018
PDF: 6 pages
Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108091S (9 October 2018); doi: 10.1117/12.2501989
Show Author Affiliations
Wenhua Zhu, Nanjing Univ. of Science and Technology (China)
Lawrence Berkeley National Lab. (United States)
Ryan Miyakawa, Lawrence Berkeley National Lab. (United States)
Lei Chen, Nanjing Univ. of Science and technology (China)
Patrick Naulleau, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 10809:
International Conference on Extreme Ultraviolet Lithography 2018
Kurt G. Ronse; Eric Hendrickx; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani, Editor(s)

© SPIE. Terms of Use
Back to Top