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Proceedings Paper

Studying resist performance for contact holes printing using EUV interference lithography
Author(s): Xiaolong Wang; Li-Ting Tseng; Dimitrios Kazazis; Zuhal Tasdemir ; Michaela Vockenhuber; Iacopo Mochi; Yasin Ekinci
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Paper Abstract

Extreme ultraviolet interference lithography (EUV-IL) is relatively simple and inexpensive technique that can pattern high resolution line/space and has been successfully used for the resist performance testing. While the aerial image in EUV-IL formed by two beams is straightforward to understand and has contrast of 1, the aerial image formed by four beams providing contact holes (CHs) is rather complicated. The phases of the interfering beams as well as by the polarization play big roles in the image of the interference pattern and its contrast. To understand thoroughly the formation of CH, we investigate theoretically polarization effect on the aerial image generated with two and four-beam interference. We show the coherent four-beam interference provides the highest contrast (1) with zero initial phase. But the interference pattern strongly depends on the phase difference and switch from one to another when the phase difference between the two pairs of gratings is π/2. Consequently, the contrast also decreases and interference pattern could end with random form when the relative phase of the beams cannot be fully controlled. We propose an incoherent four-beam interference model by intentionally designing the grating with a slightly different pitch to create an optical path difference that is longer than the coherence length of the EUV light (13.5 nm). We also discuss the polarization-induced contrast loss. We verify our analytical model by printing both positive tone chemically amplified resist (CAR) and a negative tone inorganic resist.

Paper Details

Date Published: 12 October 2018
PDF: 13 pages
Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108091Z (12 October 2018); doi: 10.1117/12.2501949
Show Author Affiliations
Xiaolong Wang, Paul Scherrer Institut (Switzerland)
Li-Ting Tseng, Paul Scherrer Institut (Switzerland)
Dimitrios Kazazis, Paul Scherrer Institut (Switzerland)
Zuhal Tasdemir , Paul Scherrer Institut (Switzerland)
Michaela Vockenhuber, Paul Scherrer Institut (Switzerland)
Iacopo Mochi, Paul Scherrer Institut (Switzerland)
Yasin Ekinci, Paul Scherrer Institut (Switzerland)


Published in SPIE Proceedings Vol. 10809:
International Conference on Extreme Ultraviolet Lithography 2018
Kurt G. Ronse; Eric Hendrickx; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani, Editor(s)

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