Share Email Print
cover

Proceedings Paper • new

Debris free high brightness light source based on LPP for actinic EUV microscopy and metrology applications
Author(s): Konstantin Koshelev; Alexander Vinokhodov; Oleg Yakushev; Alexey Yakushkin; Dimitri Abramenko; Alexander Lash; Mikhail Krivokorytov; Yuri Sidelnikov; Vladimir Ivanov; Vladimir Krivtsun; Vyacheslav Medvedev; Denis Glushkov; Pavel Seroglazov; Samir Ellwi; Rainer Lebert
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The progress of EUVL and the introduction of HVM scanners demands advanced actinic metrology especially for the EUV mask supply chain. For stand alone field use reliable metrology sources for EUV inband emission around 13.5 nm are critically needed. For nanometer resolution the effective “inband brightness” is extremely important. Laser produced EUV sources (LPP) are cost effective with efficient energy use thus providing a reliable approach for real-life industrial applications. However, apart from the Cymer/ASML LPP scanner source no such source is available. One reason is that realizing a reliable tin droplet target is beyond the technical and financial scope of a metrology source. In this paper, we propose a path to make industrial laser produced plasma based EUV sources reliable and with easy renewable targets a reality.

Paper Details

Date Published: 3 October 2018
PDF: 1 pages
Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108091Q (3 October 2018); doi: 10.1117/12.2501812
Show Author Affiliations
Konstantin Koshelev, EUV Labs, Ltd. (Russian Federation)
Institute of Spectroscopy (Russian Federation)
Alexander Vinokhodov, EUV Labs, Ltd. (Russian Federation)
Oleg Yakushev, EUV Labs, Ltd. (Russian Federation)
Alexey Yakushkin, EUV Labs, Ltd. (Russian Federation)
Dimitri Abramenko, EUV Labs, Ltd. (Russian Federation)
Alexander Lash, EUV Labs, Ltd. (Russian Federation)
Mikhail Krivokorytov, EUV Labs, Ltd. (Russian Federation)
Institute for Spectroscopy (Russian Federation)
Yuri Sidelnikov, Institute for Spectroscopy (Russian Federation)
Vladimir Ivanov, Institute for Spectroscopy (Russian Federation)
Vladimir Krivtsun, Institute for Spectroscopy (Russian Federation)
Vyacheslav Medvedev, EUV Labs, Ltd. (Russian Federation)
Denis Glushkov, ISTEQ (Netherlands)
Pavel Seroglazov, ISTEQ (Netherlands)
Samir Ellwi, ISTEQ (Netherlands)
Rainer Lebert, Research Instruments GmbH (Germany)


Published in SPIE Proceedings Vol. 10809:
International Conference on Extreme Ultraviolet Lithography 2018
Kurt G. Ronse; Eric Hendrickx; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani, Editor(s)

© SPIE. Terms of Use
Back to Top