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Actinic tools for EUV resist characterization in research and production
Author(s): R. Lebert; T. Missalla; C. Phiesel; C. Piel; S. Brose; S. Danylyuk; P. Loosen; K. Bergmann; J. Vieker
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Paper Abstract

Most of the cutting edge EUV photoresist research and development is currently being performed at RD beamlines or pre-production scanners. However, during EUVL introduction into mass production, more economic stand-alone solutions at the suppliers are needed. Within the portfolio of actinic EUV tools we offer a variety of solutions for resist characterization (sensitivity, contrast, resolution, absorbance, degradation and stability). Together with our research partners we have building blocks for actinic EUV solutions operating at a wavelength of 13.5 nm. Our expertise is the realization of customized solutions for the industry ranging from proof of principle experiments/setups to full functional industrial tools for the quality assessment in production.

Paper Details

Date Published: 3 October 2018
PDF: 1 pages
Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108091V (3 October 2018); doi: 10.1117/12.2501800
Show Author Affiliations
R. Lebert, RI Research Instruments GmbH (Germany)
T. Missalla, RI Research Instruments GmbH (Germany)
C. Phiesel, RI Research Instruments GmbH (Germany)
C. Piel, RI Research Instruments GmbH (Germany)
S. Brose, RWTH Aachen Univ. (Germany)
S. Danylyuk, RWTH Aachen Univ. (Germany)
P. Loosen, RWTH Aachen Univ. (Germany)
Fraunhofer-Institut für Lasertechnik (Germany)
K. Bergmann, Fraunhofer-Institut für Lasertechnik (Germany)
J. Vieker, Fraunhofer-Institut für Lasertechnik (Germany)


Published in SPIE Proceedings Vol. 10809:
International Conference on Extreme Ultraviolet Lithography 2018
Kurt G. Ronse; Eric Hendrickx; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani, Editor(s)

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