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Proceedings Paper

Spatially resolved reflectometry for EUV optical components
Author(s): Frank Scholze; Andreas Fischer; Claudia Tagbo; Christian Buchholz; Victor Soltwisch; Christian Laubis
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Paper Abstract

The introduction of EUV lithography into high volume manufacturing poses new challenges to any optical component in the lithography machines. Particularly the homogeneity of the optical properties is of importance. The present measurement capabilities of PTB using synchrotron radiation are based on a monochromatized, focused beam with a typical footprint on the sample in the order of 1 mm2. This, however, is not sufficient to detect small defects of optical coatings, local effects of irradiation and lifetime experiments or the like. We present our new set-ups for the spatially resolved measurement of reflectance and transmittance of optical elements. For the transmittance measurement we prepare a homogeneous almost parallel beam and place a CCD detector close behind the sample. For a sufficiently parallel beam and short enough distance, the resulting resolution is defined by the CCD pixel size, 13.5 μm square. For the spatial resolved reflectance measurement, the illuminated spot on the mirror under investigation is imaged with 10x magnification using a Wolter-type optic onto a CCD. The grazing incidence Wolter optic provides a broad-band transmittance for the optics starting from about 6 nm to longer wavelengths and thus allows measuring spectrally resolved the full reflectance curve of Mo/Si mirrors.

Paper Details

Date Published: 9 October 2018
PDF: 8 pages
Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108091U (9 October 2018); doi: 10.1117/12.2501774
Show Author Affiliations
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)
Andreas Fischer, Physikalisch-Technische Bundesanstalt (Germany)
Claudia Tagbo, Physikalisch-Technische Bundesanstalt (Germany)
Christian Buchholz, Physikalisch-Technische Bundesanstalt (Germany)
Victor Soltwisch, Physikalisch-Technische Bundesanstalt (Germany)
Christian Laubis, Physikalisch-Technische Bundesanstalt (Germany)

Published in SPIE Proceedings Vol. 10809:
International Conference on Extreme Ultraviolet Lithography 2018
Kurt G. Ronse; Eric Hendrickx; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani, Editor(s)

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