Share Email Print
cover

Proceedings Paper

Track based techniques to improve high-resolution EUV patterning defectivity
Author(s): Naoki Shibata; Lior Huli; Corey Lemley; Dave Hetzer; Eric Liu; Ko Akiteru; Shinichiro Kawakami; Karen Petrillo; Luciana Meli; Nelson Felix; Cody Murray; Alex Hubbard; Rick Johnson
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Extreme ultraviolet lithography (EUVL) technology is one of the leading candidates under consideration for enabling the next generation of devices, for 7nm node and beyond. As the focus shifts to driving down the 'effective' k1 factor and enabling the second generation of EUV patterning, new techniques and methods must be developed to reduce the overall defectivity, mitigate pattern collapse, and eliminate film-related defects. In addition, CD uniformity improvements must be continued to meet patterning performance requirements. Tokyo Electron Limited (TELTM) and IBM Corporation are continuously developing manufacturing quality processes for EUV.

Paper Details

Date Published: 19 October 2018
PDF: 7 pages
Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 1080922 (19 October 2018); doi: 10.1117/12.2501668
Show Author Affiliations
Naoki Shibata, TEL Technology Ctr., America, LLC (United States)
Lior Huli, TEL Technology Ctr., America, LLC (United States)
Corey Lemley, TEL Technology Ctr., America, LLC (United States)
Dave Hetzer, TEL Technology Ctr., America, LLC (United States)
Eric Liu, TEL Technology Ctr., America, LLC (United States)
Ko Akiteru, TEL Technology Ctr., America, LLC (United States)
Shinichiro Kawakami, Tokyo Electron Kyushu Ltd. (Japan)
Karen Petrillo, IBM Corp. (United States)
Luciana Meli, IBM Corp. (United States)
Nelson Felix, IBM Corp. (United States)
Cody Murray, IBM Corp. (United States)
Alex Hubbard, IBM Corp. (United States)
Rick Johnson, IBM Corp. (United States)


Published in SPIE Proceedings Vol. 10809:
International Conference on Extreme Ultraviolet Lithography 2018
Kurt G. Ronse; Eric Hendrickx; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani, Editor(s)

© SPIE. Terms of Use
Back to Top