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Recent bottom layered half-tone mask blanks development for large sized and high resolution flat panel displays
Author(s): Narihiro Morosawa; Yasunori Noguchi; Satoru Mochizuki; Kagehiro Kageyama
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Paper Abstract

Half-tone masks are essential for process reduction and shape control of photo reactive organic material in FPD, the importance of half-tone masks is increasing in recent large sized and high resolution displays. Half-tone masks are categorized as top layer type and bottom layer type. Process reduction and short term mask production are possible in bottom layer half-tone mask. Therefore it is expected that the demand of bottom layer half-tone mask will be increasing in future. Ulvac coating has developed two types of bottom layer half-tone mask blanks which half-tone layers are composed in Cr material or MoSi material respectively. Since each bottom layer half-tone mask blanks has different advantage in process and characteristics, it is possible to select half-tone mask blank by customer requirement. We will discuss process and characteristics of two types bottom layer half-tone mask blanks in this meeting.

Paper Details

Date Published: 3 October 2018
PDF: 6 pages
Proc. SPIE 10810, Photomask Technology 2018, 108101J (3 October 2018); doi: 10.1117/12.2501511
Show Author Affiliations
Narihiro Morosawa, ULVAC Coating Corp. (Japan)
Yasunori Noguchi, ULVAC Coating Corp. (Japan)
Satoru Mochizuki, ULVAC Coating Corp. (Japan)
Kagehiro Kageyama, ULVAC Coating Corp. (Japan)


Published in SPIE Proceedings Vol. 10810:
Photomask Technology 2018
Emily E. Gallagher; Jed H. Rankin, Editor(s)

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