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Resolution analysis method of retardance measurement instrument
Author(s): Guiyun Li; Linglin Zhu; Liyuan Gu; Aijun Zeng; Fang Zhang; Huijie Huang
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Paper Abstract

The wave plate is an indispensable optical element for transforming polarization state in various optical fields. In the retarder’s applications, precise measurement of the retardance is necessary. However, there is no common and effective way to analyze resolution of the retardance measuring instrument. For ensuring the retardance measurement accuracy, an analysis method involving a wedge wave plate with a tiny angle between two planes is proposed to characterize the resolution. The retardance of the wedge wave plate varies linearly and slightly due to its linear and diminutive variation of thickness. The diminutive variation of retardance versus displacement can be measured when the instrument has enough resolution. And the instrument demonstrates higher resolution when it can measure smaller retardance variation. In the experiment, a wedge wave plate is mounted on a two dimensions stage and its one surface is normal to the detecting light of the instrument. And then the retardance is measured along one certain direction and the results are fitted linearly. The method can be used to evaluate the resolution differences of retardance measurement instruments. The gained resolution of both two instruments is superior to 0.1nm. Through several experiments, it can be demonstrated that the proposed analysis method has the advantages of easy operation, high efficiency and simple configuration.

Paper Details

Date Published: 24 July 2018
PDF: 5 pages
Proc. SPIE 10827, Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018), 1082723 (24 July 2018); doi: 10.1117/12.2501234
Show Author Affiliations
Guiyun Li, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Linglin Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Liyuan Gu, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Aijun Zeng, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Fang Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Huijie Huang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 10827:
Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018)
Yingjie Yu; Chao Zuo; Kemao Qian, Editor(s)

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