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Angle position monitoring technology of micro-mirror array for freeform illumination module in immersion lithography
Author(s): Xiaozhe Ma; Fang Zhang; Zongshun Zeng; Siyu Zhu; Aijun Zeng; Huijie Huang
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Paper Abstract

In the 28nm and below nodes lithography machine, the freeform pupil illumination has been widely used with the application of source mask optimization technology. As one of the most important implementations, the freeform illumination module is equipped with micro-mirror array (MMA), which can generate arbitrary pupil by adjusting its angle position. It is necessary to monitor the angle position of MMA real time for its significant function. However, there are several difficulties in the monitoring: 1) The monitoring unit could not disturb the working light path. This determines that the monitoring light should be glancing incident onto the micro-mirror; 2) The size of micro-mirror is relative small. And its rotation angle range is relative large in two dimensions; 3) There are several thousands of micro-mirrors. The crosstalk should be avoided in the monitoring method. In order to find a suitable monitoring method, the imaging and Fourier transform methods are studied. In the imaging method, the reticle is imaged onto the detector with the reflection of a single micro-mirror. The center of the reticle image is calculated to represent the angle position. In the Fourier transform method, the angular distribution of the light reflected by the micro-mirror is detected. And the angular distribution centroid is used to evaluate the angle position. In order to verify the feasibility and compare the performance of the two methods, the influences of alignment error and the scattered light are analyzed. The simulation results show that the Fourier transform method is insensitive to the scattered light and is independent to the relative position of the micro-mirror and Fourier transform lens.

Paper Details

Date Published: 24 July 2018
PDF: 6 pages
Proc. SPIE 10827, Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018), 1082733 (24 July 2018); doi: 10.1117/12.2501223
Show Author Affiliations
Xiaozhe Ma, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Fang Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Zongshun Zeng, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Siyu Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Aijun Zeng, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Huijie Huang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 10827:
Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018)
Yingjie Yu; Chao Zuo; Kemao Qian, Editor(s)

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