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UV laser wavelength standard based on frequency doubling of He-Ne laser at 632.8 nm
Author(s): Jianbo Wang; Cong Yin; Jin Qian; Chunying Shi; Hanping Wang; Shan Cai
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Paper Abstract

UV laser wavelength standard plays important role in UV wavelength meter and spectrograph calibrating, and it is also widely used in laser induced fluorescence, molecules phosphorescence, and alkali metals gas mixtures. Usually, the continuous wave UV laser sources are obtained by two-step second harmonic generation (SHG) effects from YAG:Nd lasers, or one-step SHG with the tunable dye lasers or diode lasers as fundamental beams. However, these laser systems are expensive and complicated. In this paper, we report a low costs and simple experimental arrangement to emit a fixed wavelength UV laser by a He-Ne laser. It takes the 632.8 nm He-Ne laser as the fundamental beam to generate the second harmonic in the nonlinear optical crystal of Beta barium borate (BBO), and obtains a 316.4 nm UV laser radiation with a power of 50 μW. Benefiting from the wavelength uncertainty of the He-Ne laser, the UV laser takes the same wavelength uncertainty of 5×10-6. It means that no extra stabilization techniques are needed for the some special applications with the lower wavelength accuracy requirement. The UV laser takes an intracavity SHG configuration with two concave reflectors of short focal length to form a folded cavity. The internal power of the fundamental beam is more than 100 mW when the BBO crystal is installed. The length of the bore tube is about 30 cm, and the cavity length is no more than 50 cm. To our knowledge this is the shortest cavity in the He-Ne laser intracavity SHG ever demonstrated.

Paper Details

Date Published: 7 November 2018
PDF: 6 pages
Proc. SPIE 10819, Optical Metrology and Inspection for Industrial Applications V, 108191Q (7 November 2018); doi: 10.1117/12.2501206
Show Author Affiliations
Jianbo Wang, National Institute of Metrology (China)
Cong Yin, National Institute of Metrology (China)
Jin Qian, National Institute of Metrology (China)
Chunying Shi, National Institute of Metrology (China)
Hanping Wang, National Institute of Metrology (China)
Shan Cai, National Institute of Metrology (China)


Published in SPIE Proceedings Vol. 10819:
Optical Metrology and Inspection for Industrial Applications V
Sen Han; Toru Yoshizawa; Song Zhang, Editor(s)

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