Share Email Print
cover

Proceedings Paper

Flexible pupil correction technology for photolithography machine
Author(s): Siyu Zhu; Zhiyuan Niu; Fang Zhang; Xiaozhe Ma; Zongshun Zeng; Weijie Shi; Aijun Zeng; Huijie Huang
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The resolution limit is one of the key performance specifications of photolithography machine. And off axis illumination is one of the important resolution enhanced technologies. The generally used illumination modes include conventional, annular, quadrupole and dipole. And their performance is expressed by the characteristic parameters. To guarantee these parameters, the pupil correction unit should be adopted. Therefore, it is necessary to study the pupil correction technology for photolithography. In order to achieve flexible pupil correction, a method with correction finger is studied, which could change the regional energy by partial blocking effect. It is available to reduce regional energy by adjusting the width and length of correction finger. As a contrast, a method with grayscale filter is also analyzed. The grayscale filter has uniform transmission distribution in every region. The higher energy region corresponds to lower transmission distribution to achieve the energy balance. The comparison of the two pupil correction methods are analyzed firstly. The analysis results show that the two methods could improve pupil performance significantly and achieve the same correction results. Furthermore, the photolithography performance simulation is implemented. The results indicate that the critical dimension (CD) and H-V bias of the corrected pupils are improved consistently compared with the uncorrected pupils. In the application perspective, the method with correction finger is more flexible because its length could be adjusted to change relative blocked energy. However, the grayscale filter has to be replaced to change its correction effect.

Paper Details

Date Published: 24 July 2018
PDF: 6 pages
Proc. SPIE 10827, Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018), 1082731 (24 July 2018); doi: 10.1117/12.2501205
Show Author Affiliations
Siyu Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Zhiyuan Niu, Dongfang Jingyuan Electron Ltd. (China)
Fang Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Xiaozhe Ma, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Zongshun Zeng, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Weijie Shi, Dongfang Jingyuan Electron Ltd. (China)
Aijun Zeng, Shanghai Institute of Optics and Fine Mechanics (China)
Huijie Huang, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 10827:
Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018)
Yingjie Yu; Chao Zuo; Kemao Qian, Editor(s)

© SPIE. Terms of Use
Back to Top