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Proceedings Paper

Fabrication of convex blazed grating by native substrate grating mask
Author(s): Peiliang Guo; Quan Liu; Yanfeng Su; Yifan Lu; Jianhong Wu
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Paper Abstract

Hyperspectral imaging spectrometer is an important measurement and analysis instrument, which combines imaging with spectrum technology. Nowadays, it has been widely used in research fields of atmosphere, ocean, geology, ecology, astronomy and so on. Convex blazed grating is a key component in the hyperspectral imaging spectrometer. At present, holographic-ion beam etching is an important method to fabricate convex blazed gratings. The common way of holographic-ion beam etching is that to etch the photoresist grating mask directly. However it is difficult to control the groove of photoresist mask accurately. This paper proposes a method of fabricating convex blazed grating by native substrate grating mask, ion beam etching and reactive ion beam etching are used to fabricate a native substrate grating mask based on photoresist grating. The diffraction efficiency of the convex blazed grating is investigated by FDTD (Finite Difference Time Domain) theory. The first-order diffraction efficiency can be over 45% within visible to near-infrared waveband through controlling the blaze angle from 6.4° to 7.2°. Furthermore, a convex blazed grating has been fabricated with the period of 2.45um, the blaze angle of 6.8° and the anti-blaze angle of 60°, theoretical analysis shows that the first-order diffraction efficiency is more than 50% within visible to near-infrared waveband.

Paper Details

Date Published: 24 July 2018
PDF: 7 pages
Proc. SPIE 10827, Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018), 108272B (24 July 2018); doi: 10.1117/12.2501036
Show Author Affiliations
Peiliang Guo, Soochow Univ. (China)
Quan Liu, Soochow Univ. (China)
Yanfeng Su, Soochow Univ. (China)
Yifan Lu, Soochow Univ. (China)
Jianhong Wu, Soochow Univ. (China)


Published in SPIE Proceedings Vol. 10827:
Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018)
Yingjie Yu; Chao Zuo; Kemao Qian, Editor(s)

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