Share Email Print
cover

Proceedings Paper • new

Phase determination method for sinusoidal frequency/phase modulation displacement measuring interferometer
Author(s): Masato Higuchi; Dong Wei; Masato Aketagawa
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

As nanotechnology have been developed rapidly, it is strongly needed to measure a displacement accurately and precisely. A sinusoidal frequency modulation (SFM) and a sinusoidal phase modulation (SPM) applied interferometers could be good candidates. In the SFM, a frequency of a light source is modulated sinusoidal way. In the SPM, a phase is modulated. Characteristics of these interferometers are defined by a modulation index. The modulation index is a function of both a frequency excursion and an initial optical path difference in the SFM, and is an amplitude of phase in the SPM. For displacement measurement, the displacement is obtained by a phase of an interference signal. A phase determination method using a phase-locked loop (PLL) is reported and a few pico-meters resolution is achieved for displacement measurement with a restriction of a specific modulation index. For precise and high resolution interferometer, a stabilizing the frequency of the light source is necessary. Because the modulation index is an essential parameter in the frequency stabilization, performing phase determination with the PLL in the arbitral modulation index must be developed. The nonlinear relationship between the phase and the displacement is a problem in arbitral modulation index. We have proposed a PLL for arbitral modulation index which successively changes the relationship from the nonlinear to the linear. PC-based calculations with a theoretical and an actual interference signals have been conducted to check the feasibility of proposed PLL. In this report, displacement measurements using PC-based calculation with actual interference signals are described.

Paper Details

Date Published: 7 November 2018
PDF: 6 pages
Proc. SPIE 10819, Optical Metrology and Inspection for Industrial Applications V, 108190C (7 November 2018); doi: 10.1117/12.2501026
Show Author Affiliations
Masato Higuchi, Nagaoka Univ. of Technology (Japan)
Dong Wei, Nagaoka Univ. of Technology (Japan)
Masato Aketagawa, Nagaoka Univ. of Technology (Japan)


Published in SPIE Proceedings Vol. 10819:
Optical Metrology and Inspection for Industrial Applications V
Sen Han; Toru Yoshizawa; Song Zhang, Editor(s)

© SPIE. Terms of Use
Back to Top