Share Email Print
cover

Proceedings Paper

Design of UV LED illumination system for direct imaging lithography
Author(s): Haibo Jiang; Xiuhui Sun; Ruofu Yang; Jianjun Chen; Lin Xie; Shao-yun Yin
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

UV LED, which is used as the illumination source in the direct imaging (DI) exposure equipment, has the advantages of rich wavelengths and low cost. It has a good application prospect in the field of printed circuit board (PCB) manufacturing. An optical structure of the illumination system for DI lithography, which combines Kohler illumination and double telecentric imaging, is presented. First, the shape of the spot matched with Digital Micromirror Device (DMD) is obtained by setting an aperture at the imaging plane of LED chips to filter out the stray light. Then the aperture is imaged onto the working plane of DMD by the posterior double telecentric lens. The uniform illumination spot without stray light can be achieved on the DMD in the end. In this design, fly eyes are not needed, and the stray light on the DMD surface caused by light outside the effective angle of the LED can be filtered out completely. Based on this idea, a lithographic illumination system with the numerical aperture (NA) of 0.1 is designed and fabricated for 0.95 inch DMD. According to experimental measurements, the effective illumination power is up to 10W, and the illuminance uniformity is more than 85%, which meet the lighting requirements of direct imaging lithography equipment used in PCB manufacturing.

Paper Details

Date Published: 5 November 2018
PDF: 8 pages
Proc. SPIE 10815, Optical Design and Testing VIII, 108150W (5 November 2018); doi: 10.1117/12.2500955
Show Author Affiliations
Haibo Jiang, Chongqing Institute of Green and Intelligent Technology (China)
Xiuhui Sun, Chongqing Institute of Green and Intelligent Technology (China)
Ruofu Yang, Chongqing Institute of Green and Intelligent Technology (China)
Jianjun Chen, Chongqing Institute of Green and Intelligent Technology (China)
Lin Xie, Chongqing Institute of Green and Intelligent Technology (China)
Shao-yun Yin, Chongqing Institute of Green and Intelligent Technology (China)


Published in SPIE Proceedings Vol. 10815:
Optical Design and Testing VIII
Yongtian Wang; Tina E. Kidger; Kimio Tatsuno, Editor(s)

© SPIE. Terms of Use
Back to Top