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Proceedings Paper

Polarization aberration measurement of lithographic tools
Author(s): Shuang Xu; Gongfa Li; Bo Tao; Yongxing Guo
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Paper Abstract

The NA of immersion lithography has reached 1.35, in which case polarization effect must be taken into account. The performance of the projection lens should be characterized by polarization aberration. We proposed a polarization aberration measurement theory and method, using the binary grating structure as the mask pattern, with intensity distribution signal as the measuring signal. Pauli Zernike polynomials are adopted to characterizing the polarization aberration, and a linear relationship between intensity signal and Pauli Zernike coefficients was derived. Simulation results show that using the proposed method, the polarization aberration can be reconstructed with relative error of refactoring to 10-2.

Paper Details

Date Published: 7 November 2018
PDF: 8 pages
Proc. SPIE 10819, Optical Metrology and Inspection for Industrial Applications V, 1081909 (7 November 2018); doi: 10.1117/12.2500778
Show Author Affiliations
Shuang Xu, Wuhan Univ. of Science and Technology (China)
Guilin Univ. of Electronic Technology (China)
Gongfa Li, Wuhan Univ. of Science and Technology (China)
Bo Tao, Wuhan Univ. of Science and Technology (China)
Yongxing Guo, Wuhan Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 10819:
Optical Metrology and Inspection for Industrial Applications V
Sen Han; Toru Yoshizawa; Song Zhang, Editor(s)

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