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Key components development progress of high-power LPP-EUV light source with unique debris mitigation system using a magnetic field
Author(s): Yuichi Nishimura; Tsukasa Hori; Takayuki Yabu; Katsuhiko Wakana; Yoshifumi Ueno; Georg Soumagne; Shinji Nagai; Tatsuya Yanagida; Yasufumi Kawasuji; Yutaka Shiraishi; Tamotsu Abe; Hiroaki Nakarai; Takashi Saito; Hakaru Mizoguchi
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Paper Abstract

Gigaphoton Inc. has been developing a CO2-Sn-LPP (LPP: Laser Produced Plasma) extreme ultraviolet (EUV) light source system for high-volume manufacturing (HVM) semiconductor lithography. Original technologies and key components of this source include a high-power carbon dioxide (CO2) laser with 15 ns pulse duration, a short wavelength solid-state pre-pulse laser with 10 ps pulse duration, a highly stabilized small droplet (DL) target, a precise DL-laser shooting control system and unique debris mitigation technology with a magnetic field. In this paper, an update of the development progress of the total system and of the key components is presented.

Paper Details

Date Published: 3 October 2018
PDF: 11 pages
Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108091M (3 October 2018); doi: 10.1117/12.2500356
Show Author Affiliations
Yuichi Nishimura, Gigaphoton Inc. (Japan)
Tsukasa Hori, Gigaphoton Inc. (Japan)
Takayuki Yabu, Gigaphoton Inc. (Japan)
Katsuhiko Wakana, Gigaphoton Inc. (Japan)
Yoshifumi Ueno, Gigaphoton Inc. (Japan)
Georg Soumagne, Gigaphoton Inc. (Japan)
Shinji Nagai, Gigaphoton Inc. (Japan)
Tatsuya Yanagida, Gigaphoton Inc. (Japan)
Yasufumi Kawasuji, Gigaphoton Inc. (Japan)
Yutaka Shiraishi, Gigaphoton Inc. (Japan)
Tamotsu Abe, Gigaphoton Inc. (Japan)
Hiroaki Nakarai, Gigaphoton Inc. (Japan)
Takashi Saito, Gigaphoton Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)


Published in SPIE Proceedings Vol. 10809:
International Conference on Extreme Ultraviolet Lithography 2018
Kurt G. Ronse; Eric Hendrickx; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani, Editor(s)

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