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Measurement setup for the determination of the nonlinear refractive index of thin films with high nonlinearity
Author(s): Morten Steinecke; Tarik Kellermann; Marco Jupé; Detlev Ristau; Lars Jensen
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Paper Abstract

The exploitation of nonlinear effects in multi-layer thin films allows for optics with novel functions, such as all- optical switching and frequency conversion. In this contribution, an improved interferometric setup for the measurement of the nonlinear refractive index in dielectric substrates and deposited single layers is presented. The setup is based on the wave front deformation caused by the self-focusing in the measured samples. Additionally, measurement results for a highly nonlinear material, indium-tin-oxide (ITO) are presented with respect to the materials power handling capabilities and compared to values from other materials.

Paper Details

Date Published: 20 November 2018
PDF: 8 pages
Proc. SPIE 10805, Laser-Induced Damage in Optical Materials 2018: 50th Anniversary Conference, 1080524 (20 November 2018); doi: 10.1117/12.2500341
Show Author Affiliations
Morten Steinecke, Laser Zentrum Hannover e.V. (Germany)
Tarik Kellermann, Laser Zentrum Hannover e.V. (Germany)
Marco Jupé, Laser Zentrum Hannover e.V. (Germany)
Detlev Ristau, Laser Zentrum Hannover e.V. (Germany)
Leibniz Univ. Hannover (Germany)
Lars Jensen, Laser Zentrum Hannover e.V. (Germany)


Published in SPIE Proceedings Vol. 10805:
Laser-Induced Damage in Optical Materials 2018: 50th Anniversary Conference
Christopher Wren Carr; Gregory J. Exarhos; Vitaly E. Gruzdev; Detlev Ristau; M.J. Soileau, Editor(s)

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