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Novel etching fluids for potassium dihydrogen phosphate
Author(s): Salmaan Baxamusa; John Adams; Paul Ehrmann; Steven Hawks; Ted Laurence; Marlon Menor; Jemi Ong; Kathleen Schaffers
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Paper Abstract

Absorbing defects such as fractures and contaminants are a leading cause of surface damage in nanosecond pulsed lasers. Etching such defects has proven to be a powerful technique for increasing the laser damage threshold of fused silica, but to date no etching process has been reported for potassium dihydrogen phosphate (KH2PO4 or KDP) or its deuterated analog (DKDP). We show that physical dissolution in water is a viable strategy for etching DKDP surfaces but surface-redeposited byproducts can serve as laser damage precursors. We use a water-in-oil microemulsion to etch engineered surface fractures in DKDP. Etching widens surface fractures laterally and decreases their optical activity, as measured by photoluminescence. The removal of 1 μm of the surface of a DKDP crystal increases the laser damage threshold (λ = 355 nm, 7 ns) of the engineered surface fractures by 2-4 J/cm2 (15-30%).

Paper Details

Date Published: 16 November 2018
PDF: 5 pages
Proc. SPIE 10805, Laser-Induced Damage in Optical Materials 2018: 50th Anniversary Conference, 108051G (16 November 2018); doi: 10.1117/12.2500297
Show Author Affiliations
Salmaan Baxamusa, Lawrence Livermore National Lab. (United States)
John Adams, Lawrence Livermore National Lab. (United States)
Paul Ehrmann, Lawrence Livermore National Lab. (United States)
Steven Hawks, Lawrence Livermore National Lab. (United States)
Ted Laurence, Lawrence Livermore National Lab. (United States)
Marlon Menor, Lawrence Livermore National Lab. (United States)
Jemi Ong, Lawrence Livermore National Lab. (United States)
Kathleen Schaffers, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 10805:
Laser-Induced Damage in Optical Materials 2018: 50th Anniversary Conference
Christopher Wren Carr; Gregory J. Exarhos; Vitaly E. Gruzdev; Detlev Ristau; M.J. Soileau, Editor(s)

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