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Proceedings Paper

One-level gray-tone lithography: mask data preparation and pattern transfer
Author(s): Klaus Reimer; Hans Joachim Quenzer; Rita Demmeler; Bernd Wagner
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Paper Abstract

This paper reports on a methodology for fabrication of arbitrarily shaped structures using technologies common to standard IC manufacturing processes. Particular emphasis is put on the design and use of halftone transmission masks for the lithography step required in the fabrication process of mechanical, optical or electronics components. The algorithms to transfer an initial height profile into a design representation in the common data format GDSII are discussed. This set of data could be used directly by a commercial mask shop. The great data amount of a reticle layout has been reduced significantly by a first order data compaction. The possibly nonlinear influences of the different process steps on the transfer function have been regarded. The specific parameters for the mask making and the resist process are determined. Several components like shaped gratings or lenses have been realized in resist up to 10 micrometers thick. In the field of transferring the pattern into a substrate material like silicon or glass, a dry etching process was evaluated.

Paper Details

Date Published: 26 August 1996
PDF: 9 pages
Proc. SPIE 2783, Micro-Optical Technologies for Measurement, Sensors, and Microsystems, (26 August 1996); doi: 10.1117/12.248506
Show Author Affiliations
Klaus Reimer, Fraunhofer-Institut fuer Siliziumtechnologie (Germany)
Hans Joachim Quenzer, Fraunhofer-Institut fuer Siliziumtechnologie (Germany)
Rita Demmeler, Fraunhofer-Institut fuer Siliziumtechnologie (Germany)
Bernd Wagner, Fraunhofer-Institut fuer Siliziumtechnologie (Germany)

Published in SPIE Proceedings Vol. 2783:
Micro-Optical Technologies for Measurement, Sensors, and Microsystems
Olivier M. Parriaux, Editor(s)

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