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Proceedings Paper

Deposition of conventional and gradient optical coatings by ECR plasma-enhanced chemical vapor deposition
Author(s): Pavel V. Bulkin; Pieter L. Swart; Beatrys M. Lacquet; Anatoli A. Chtcherbakov
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Paper Abstract

The computer-controlled electron cyclotron resonance plasma enhanced chemical vapor deposition of SiOxNy was used for the manufacturing of optical interference coatings with inhomogeneous and traditional multilayer refractive index profiles. Such complex structures as triple-band rugate optical interference filters and graded refractive index antireflection coatings were grown. The design of coatings was performed using measured optical constants of the SiOxNy-system.

Paper Details

Date Published: 19 August 1996
PDF: 12 pages
Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); doi: 10.1117/12.246840
Show Author Affiliations
Pavel V. Bulkin, Rand Afrikaans Univ. (South Africa) and Ecole Polytechnique (France) (France)
Pieter L. Swart, Rand Afrikaans Univ. (South Africa)
Beatrys M. Lacquet, Rand Afrikaans Univ. (South Africa)
Anatoli A. Chtcherbakov, Rand Afrikaans Univ. (South Africa)

Published in SPIE Proceedings Vol. 2776:
Developments in Optical Component Coatings
Ian Reid, Editor(s)

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