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Proceedings Paper

Polarizers at 1.053 um deposited on silica substrate for high laser flux applications in a vacuum
Author(s): Bernard Geenen; Herve Leplan; B. Pinot; W. Alexandre; P. Pally; Larry A. Roussel; Odile Lam
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Paper Abstract

The French Megajoule Project requires polarizers with high laser-induced damage thresholds. Such polarizers must be deposited on silica substrates, which are commonly prone to stress leading to early failure. Better stress control in the films require an optimization of the stack design as well as the deposition parameters. The thermal e-beam technique is used. We present the spectral behavior of such 1.03 micrometers polarizers in air and under vacuum at the Brewster incidence angle of 55 degrees 4 along with the damage test results.

Paper Details

Date Published: 19 August 1996
PDF: 9 pages
Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); doi: 10.1117/12.246815
Show Author Affiliations
Bernard Geenen, SFIM ODS (France)
Herve Leplan, Matra Defense (France)
B. Pinot, SFIM ODS (France)
W. Alexandre, SFIM ODS (France)
P. Pally, SFIM ODS (France)
Larry A. Roussel, Northrop Corp. (United States)
Odile Lam, Altran Technologies (France)


Published in SPIE Proceedings Vol. 2776:
Developments in Optical Component Coatings
Ian Reid, Editor(s)

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