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Proceedings Paper

Real-time monitoring by multiwavelength ellipsometry of the growth of silicon alloy multilayers and gradient index structures
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Paper Abstract

Real time monitoring and control, by multiwavelength phase modulated ellipsometry of the growth of plasma deposited optical structures is presented. The transparent layers consists of SiO2 SiNx and oxynitrides. We present an efficient method for the estimation of the optical parameters based on a sliding window containing the last acquired measurements. This method is used to monitor the deposition of multilayer coatings with homogenous deposition conditions, and is also used in feedback control of such coatings. The sliding window method is further developed to follow slowly time-varying parameters such as the deposition rate. A preliminary study of a fast novel method based on the same principle for real time monitoring of refractive index gradients is described. As an example, the real time monitoring of the growth of a linear gradient index is demonstrated.

Paper Details

Date Published: 19 August 1996
PDF: 12 pages
Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); doi: 10.1117/12.246805
Show Author Affiliations
Morten Kildemo, Ecole Polytechnique (France) and Norwegian Univ. of Science and Technology (Norway)
S. Deniau, Ecole Polytechnique (France)
Pavel Bulkin, Ecole Polytechnique (France)
Bernard Drevillon, Ecole Polytechnique (France)
Ola D. Hunderi, Norwegian Univ. of Science and Technology (Norway)


Published in SPIE Proceedings Vol. 2776:
Developments in Optical Component Coatings
Ian Reid, Editor(s)

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