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Proceedings Paper

Study of the influence of nonuniform pupils in photolithographic systems through the apparent transfer function
Author(s): Maria Josefa Yzuel; Rosemarie Hild; Juan Carlos Campos Rubio; Juan C. Escalera
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Paper Abstract

We have studied nonuniform transmission filters to improve resolution and/or Depth of Focus in lithography. To understand the transmission behavior of these filters for periodic structures we discuss the Apparent Transfer Function in dependence on the defocus. We use the Apparent Transfer Function that is defined by the contrast of the corresponding spatial frequencies, and we analyze the behavior of the system for coherent, incoherent and partially coherent illumination.

Paper Details

Date Published: 23 August 1996
PDF: 9 pages
Proc. SPIE 2774, Design and Engineering of Optical Systems, (23 August 1996); doi: 10.1117/12.246680
Show Author Affiliations
Maria Josefa Yzuel, Univ. Autonoma de Barcelona (Spain)
Rosemarie Hild, Friedrich-Schiller Univ. (Germany)
Juan Carlos Campos Rubio, Univ. Autonoma de Barcelona (Spain)
Juan C. Escalera, Univ. Autonoma de Barcelona (Spain)


Published in SPIE Proceedings Vol. 2774:
Design and Engineering of Optical Systems
Joseph J. M. Braat, Editor(s)

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