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Proceedings Paper

Ellipsometric study of rare gas films physisorbed on a surface of a metal single crystal
Author(s): Sin-ichi Igarashi; Takato Hirayama; Ichiro Arakawa; Yukio Abe
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Paper Abstract

We have developed a new experimental equipment for the ellipsometric study of a physisorption system on a surface of a metal single crystal; a vacuum chamber with an ultimate pressure of 10-9 Pa, a substrate temperature between 40 K and 1000 K, and the automatic null ellipsometer. The adsorption isotherms of Xe/Ag(111) at temperatures between 60 K and 80 K were obtained in the wide pressure range between 10-7 Pa and 10-1 Pa. We found that this ellipsometer made it possible to observe layer growth of a van der Waals condensate from a submonolayer range to a thick layer where equilibrium pressure was nearly equal to the bulk saturation vapor pressure of the adsorbate.

Paper Details

Date Published: 16 August 1996
PDF: 4 pages
Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); doi: 10.1117/12.246227
Show Author Affiliations
Sin-ichi Igarashi, Gakushuin Univ. (Japan)
Takato Hirayama, Gakushuin Univ. (Japan)
Ichiro Arakawa, Gakushuin Univ. (Japan)
Yukio Abe, Gakushuin Univ. (Japan)


Published in SPIE Proceedings Vol. 2873:
International Symposium on Polarization Analysis and Applications to Device Technology
Toru Yoshizawa; Hideshi Yokota, Editor(s)

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