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Proceedings Paper

In-situ ultrahigh vacuum spectroscopic ellipsometry
Author(s): Tomoyuki Fukazawa; Kazuki Ishihara; Yoichi Hoshi; Shuichi Kawabata
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Paper Abstract

Polarization modulated spectroellipsometer was utilized to monitor, in-situ, deposition of Ag on Si substrate. The angle of incidence was determined using a Si substrate covered with native oxide. In the wavelength region of 550 nm to 700 nm, the ambiguity of the angle of incidence was within 0.2 deg. A plasma resonance peak manifested in reflectance spectrum around 350 nm increased and shifted to shorter wavelength as the deposition time increased from 1 sec to 10 sec. (Delta) (Psi) trajectory approached to a simulation curve of a continuous film as the deposition time increased to 40 sec where the film thickness was estimated to be 20 nm.

Paper Details

Date Published: 16 August 1996
PDF: 4 pages
Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); doi: 10.1117/12.246213
Show Author Affiliations
Tomoyuki Fukazawa, JASCO Corp. (Japan)
Kazuki Ishihara, Tokyo Institute of Polytechnics (Japan)
Yoichi Hoshi, Tokyo Institute of Polytechnics (Japan)
Shuichi Kawabata, Tokyo Institute of Polytechnics (Japan)


Published in SPIE Proceedings Vol. 2873:
International Symposium on Polarization Analysis and Applications to Device Technology
Toru Yoshizawa; Hideshi Yokota, Editor(s)

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