Share Email Print
cover

Proceedings Paper

Infrared reflection polarizers using uniform and diffuse low-index layers buried in high-index substrates
Author(s): Rasheed M. A. Azzam; Mostofa M. K. Howlader
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The extinction ratio ER and the reflectance, or throughput, for the unextinguished s polarization Rs are calculated for infrared reflection polarizers that consist of a low- index transparent layer embedded in a high-index transparent substrate. Iso-ER and iso-Rs contours illustrate the dependence of the ER and Rs for a specific IR polarizer on the depth and width of a buried layer of SiO2 in Si at 3.5-micrometers wavelength and 80 degree(s) angle of incidence. Both cases of a uniform layer with sharp boundaries and a diffuse Gaussian layer are considered. The diffuse-layer model employs Bruggeman's effective medium theory and is intended to simulate devices that are fabricated by the oxygen-ion implantation of Si. The angular and wavelength sensitivities of these polarizers are determined.

Paper Details

Date Published: 16 August 1996
PDF: 4 pages
Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); doi: 10.1117/12.246204
Show Author Affiliations
Rasheed M. A. Azzam, Univ. of New Orleans (United States)
Mostofa M. K. Howlader, Univ. of Central Florida (United States)


Published in SPIE Proceedings Vol. 2873:
International Symposium on Polarization Analysis and Applications to Device Technology
Toru Yoshizawa; Hideshi Yokota, Editor(s)

© SPIE. Terms of Use
Back to Top