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Proceedings Paper

In-situ monitor and control using fast spectroscopic ellipsometry
Author(s): John A. Woollam; Xiang Gao; Scott Heckens; James N. Hilfiker
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Paper Abstract

A four gun magnetron sputter deposition chamber equipped with in-situ spectroscopic ellipsometry is described, and the results of precisely controlled multilayered metallic and dielectric materials are reported. These structures have applications in magneto-optic memories, as well as giant magneto resistance and spin-valve magnetic read-heads.

Paper Details

Date Published: 16 August 1996
PDF: 4 pages
Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); doi: 10.1117/12.246202
Show Author Affiliations
John A. Woollam, J.A. Woollam Co. and Univ. of Nebraska (United States)
Xiang Gao, Univ. of Nebraska (United States)
Scott Heckens, Univ. of Nebraska (United States)
James N. Hilfiker, J. A. Woollam Co., Inc. (United States)


Published in SPIE Proceedings Vol. 2873:
International Symposium on Polarization Analysis and Applications to Device Technology
Toru Yoshizawa; Hideshi Yokota, Editor(s)

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