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Proceedings Paper

Heterodyne interferometer for film thickness and refractive index measurements of optical thin film
Author(s): Nobuhiro Shimizu; Junya Yuguchi; Hideo Takahashi
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Paper Abstract

An optical heterodyne interferometer that uses various laser beams was constructed using two acousto-optic tunable filters with slightly different frequencies of the diffracted light. A film thickness and refractive index of a SiO2 thin-film on the Si substrate were measured by varying the wavelength using this apparatus.

Paper Details

Date Published: 16 August 1996
PDF: 4 pages
Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); doi: 10.1117/12.246196
Show Author Affiliations
Nobuhiro Shimizu, Shibaura Institute of Technology (Japan)
Junya Yuguchi, Shibaura Institute of Technology (Japan)
Hideo Takahashi, Shibaura Institute of Technology (Japan)


Published in SPIE Proceedings Vol. 2873:
International Symposium on Polarization Analysis and Applications to Device Technology

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