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Proceedings Paper

In-situ growth control of x-ray multilayers using visible light kinetic ellipsometry and grazing incidence x-ray reflectometry
Author(s): Eike Luken; Eric Ziegler; Manohar Lingham
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Paper Abstract

The manufacturing of x-ray multilayers calls for a precise control of layers having individual thicknesses in the nanometer range and with minimum diffusion at the interfaces. Visible light kinetic ellipsometry and grazing incidence hard x-ray reflectometry (8 keV) have been used under a plasma sputtering environment. The growth of W/Si multilayers illustrates the capabilities of both methods. Thickness, density and roughness values have been derived for each layer by simulation of the experimental data. Those values fit very well the grazing x-ray reflectivity data obtained on the final multilayer exposed to the atmosphere, except for the last 2 layers as a result of oxidation.

Paper Details

Date Published: 16 August 1996
PDF: 6 pages
Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); doi: 10.1117/12.246194
Show Author Affiliations
Eike Luken, European Synchrotron Radiation Facility (France)
Eric Ziegler, European Synchrotron Radiation Facility (France)
Manohar Lingham, European Synchrotron Radiation Facility (France)


Published in SPIE Proceedings Vol. 2873:
International Symposium on Polarization Analysis and Applications to Device Technology
Toru Yoshizawa; Hideshi Yokota, Editor(s)

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