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Proceedings Paper

Superflat high-reflectivity semitransparent polarizer for soft x-ray
Author(s): Tsuneyuki Haga; Marcia C. K. Tinone; Masaru Shimada; Takashi Ohkubo; Akira Ozawa
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Paper Abstract

We have developed semi-transparent multilayer polarizers for polarimetry or ellipsometry in the soft x-ray region. We have studied the fabrication processes to achieve a flat and smooth freestanding reflection surface for high-performance semi-transparent multilayer beam-splitters, mainly the stress control of Mo/Si multilayer films and the surface roughness of the support membrane. In this work, we verified that these processes can be applicable to fabricate not only beam-splitters but also polarizers with high reproducibility. The flatness of 1.1 nm (rms) was obtained in the active area of a 11 mm square semi-transparent multilayer polarizer. The measured reflectivity and transmittance rates for s-polarization using synchrotron radiation were 45.3% and 5.6%, respectively, at a wavelength of 13.9 nm. We estimated the polarization characteristics by calculating its relative reflectivity, relative transmittance and phase shift for polarization experiments. As a result of the calculation, we verified that the fabricated semi-transparent multilayer polarizers can be adequately used as a polarizer with polarizance of 69.5% and high throughput of 28.9%, or as a phase shifter of 68 degrees with equal transmission ratio and high throughput of 4.9% for x-ray polarimetry or ellipsometry.

Paper Details

Date Published: 16 August 1996
PDF: 4 pages
Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); doi: 10.1117/12.246192
Show Author Affiliations
Tsuneyuki Haga, NTT LSI Labs. (Japan)
Marcia C. K. Tinone, NTT LSI Labs. (Japan)
Masaru Shimada, NTT LSI Labs. (Japan)
Takashi Ohkubo, NTT Advanced Technology Corp. (Japan)
Akira Ozawa, NTT Advanced Technology Corp. (Japan)

Published in SPIE Proceedings Vol. 2873:
International Symposium on Polarization Analysis and Applications to Device Technology
Toru Yoshizawa; Hideshi Yokota, Editor(s)

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