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Proceedings Paper

First thin film ellipsometry at a photon energy of 97eV with use of high-performance multilayer polarizers
Author(s): Masaki Yamamoto; K. Mayama; Hidekazu Kimura; Minaji Furudate; Mihiro Yanagihara
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Paper Abstract

In the extreme ultraviolet (EUV) region, synthetic multilayer structures are found useful as reflection polarizers. Such structures of transmission type made by removing from substrates are found useful as polarizers and phase shifters. With these multilayer polarizing elements developed, the first thin ellipsometry was performed at a photon energy of 97 eV (12.8 nm in wavelength), which demonstrated atomic sensitivity of the EUV ellipsometry.

Paper Details

Date Published: 16 August 1996
PDF: 4 pages
Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); doi: 10.1117/12.246183
Show Author Affiliations
Masaki Yamamoto, Tohoku Univ. (Japan)
K. Mayama, Japan Synchrotron Radiation Research Inst. (Japan)
Hidekazu Kimura, Japan Synchrotron Radiation Research Inst. (Japan)
Minaji Furudate, Tohoku Univ. (Japan)
Mihiro Yanagihara, Tohoku Univ. (Japan)


Published in SPIE Proceedings Vol. 2873:
International Symposium on Polarization Analysis and Applications to Device Technology
Toru Yoshizawa; Hideshi Yokota, Editor(s)

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