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Proceedings Paper

Chemically amplified resist process for 0.25-um generation photomasks
Author(s): Mikio Katsumata; Hiroichi Kawahira; Minoru Sugawara; Satoru Nozawa
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Paper Abstract

A chemically amplified (CA) negative electron beam resist process is developed for fabricating 0.25 μm devices 4X magnification reticles. In order to improve a critical dimension (CD) uniformity on reticles, a precise temperature controllability in post exposure baking (PEB) is realized. Dry etching for Cr is also adopted for getting an appropriate pattern fidelity down to submicron on reticles to meet requirements for such as optical proximity effect correction. Under the optimized process conditions, a CD uniformity of 0.016 μm in 3σ is achieved on reticles. A CD linearity of down to 0.8 μm on the reticles is ensured as well. Actual 0.25 μm device reticle production results show that the CD mean variation is controlled within ± 0.040 μm. It is confirmed that an advanced 4X reticle fabrication process for 0.25 μm device generation is realized.

Paper Details

Date Published: 24 July 1996
PDF: 9 pages
Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245249
Show Author Affiliations
Mikio Katsumata, Sony Corp. (Japan)
Hiroichi Kawahira, Sony Corp. (Japan)
Minoru Sugawara, Sony Corp. (Japan)
Satoru Nozawa, Sony Corp. (Japan)

Published in SPIE Proceedings Vol. 2793:
Photomask and X-Ray Mask Technology III
Hideo Yoshihara, Editor(s)

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