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Proceedings Paper

Evaluation of phase and transmittance error on deep-UV halftone phase-shift mask
Author(s): Suigen Kyoh; Hideaki Sakurai; Takayuki Iwamatsu; Akiko Yamada; Iwao Higashikawa
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Paper Abstract

The effect of phase shift and transmittance fluctuation in a mask plate have been studied. The differences of these optical properties of halftone phase shift masks result in critical dimension(CD) error on a wafer so that these fluctuation in a plate reduce the process window across the exposure field. In considering CD error budget, such factors as phase shift and transmittance has to be taken into account. To estimate this budget, a set of test masks were fabricated, in which phase shift and transmittance are varied, and the exposures using these masks under the same conditions were performed.

Paper Details

Date Published: 24 July 1996
PDF: 7 pages
Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245248
Show Author Affiliations
Suigen Kyoh, Toshiba Corp. (Japan)
Hideaki Sakurai, Toshiba Corp. (Japan)
Takayuki Iwamatsu, Toshiba Corp. (Japan)
Akiko Yamada, Toshiba Corp. (Japan)
Iwao Higashikawa, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 2793:
Photomask and X-Ray Mask Technology III
Hideo Yoshihara, Editor(s)

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