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Proceedings Paper

Automatic photomask defect classification method
Author(s): Kyoji Yamashita; Kazuto Matsuki; Kiminobu Akeno
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Paper Abstract

This paper describes a new image-processing algorithm for classifying photomask defects as pindots or contamination as a step toward automated inspection equipment for the one-micron generation. To detect contamination on quartz, our method extracts the gradient of the transmitted image within the dark region of reflected image. Contamination on the opaque membrane can also be detected by using the same method but with the transmitted image and reflected image mutually transposed. Standard particles of 0.3 to 0.5 micron can be detected with particles on quartz and particles on opaque membrane separated.

Paper Details

Date Published: 24 July 1996
PDF: 9 pages
Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245246
Show Author Affiliations
Kyoji Yamashita, Toshiba Corp. (Japan)
Kazuto Matsuki, Toshiba Corp. (Japan)
Kiminobu Akeno, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 2793:
Photomask and X-Ray Mask Technology III
Hideo Yoshihara, Editor(s)

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