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Proceedings Paper

Detection and printability of random and programmed pinholes on Cr photomasks
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Paper Abstract

In this paper, we describe pinhole detectivity using both pattern inspection and STARlight inspection. Examples of STARlight inspection of naturally-occurring pinholes are shown as well. Small pinholes are not be easily detected by pattern inspectors and are rarely detected by laser-based scatterometers. The construction of the programmed defect mask is described, and inspection tool performance on programmed defects is quantified. In addition, printability of selected defects is assessed by AIMS and correlated to inspection tool detectivity.

Paper Details

Date Published: 24 July 1996
PDF: 12 pages
Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245244
Show Author Affiliations
Franklin D. Kalk, DuPont Photomasks, Inc. (United States)
Anthony Vacca, KLA Instruments Corp. (United States)
Charles H. Howard, DuPont Photomasks, Inc. (United States)
Linard Karklin, Sigma-C U.S.A. (United States)


Published in SPIE Proceedings Vol. 2793:
Photomask and X-Ray Mask Technology III
Hideo Yoshihara, Editor(s)

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