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Proceedings Paper

Die-to-database inspection of 256-Mb DRAM reticles
Author(s): Yair Eran; Nissim Elmaliach; Yonatan Lehaman; Eyal Mizrahi; Gideon Rossman
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Paper Abstract

256 Mbit DRAM devices pose a great challenge to the mask manufacturers. Shrinking kne widths, tighter CD requirements, new lithography enhancement techniques, dense data bases, and higher sensitMty to half-tone defects require advanced process and inspection systems. The improvements and changes in mask manufacturing are translated into three main characteristics of a dietodatabase inspection system: Image quality, reference data injection and defect detection. In order to meet the challenge of inspecting 256 Mbit DRAM masks various enhancements need to be implemented in die.. to-database inspection systems which bring the above characteristics to the required level and supply the mask maker with a highly reliable and sensitive tool.

Paper Details

Date Published: 24 July 1996
PDF: 6 pages
Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245243
Show Author Affiliations
Yair Eran, Orbot Instruments Ltd. (Israel)
Nissim Elmaliach, Orbot Instruments Ltd. (Israel)
Yonatan Lehaman, Orbot Instruments Ltd. (Israel)
Eyal Mizrahi, Orbot Instruments Ltd. (Israel)
Gideon Rossman, Orbot Instruments (Japan)

Published in SPIE Proceedings Vol. 2793:
Photomask and X-Ray Mask Technology III
Hideo Yoshihara, Editor(s)

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