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Proceedings Paper

Investigation of phase-shift mask shifter defect printability and inspection techniques
Author(s): Yasuhiro Koizumi; Daniel L. Lopez
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Paper Abstract

Establishing an effective inspection method for PSM's shifter defects is a very important factor in successful production of PSM under i-line and DUV for 0.25 μm process rules. We have used a PSM with programmed shifter defects to confirm the minimum printable defect size under 0.25 μm rule process environment using i-line and DUV steppers. The same plate was then inspected by a special-detection experimental transmitted and reflected(ETR) and KLA3O1 D/D inspection system which KLA has developed in cooperation with Hitachi to evaluate its detection performance on those printable defects. We report that characteristic of this inspection system, which uses both transmitted and reflected light and special detection algorithm, is an effective tool. We will be able to supply defect free PSM for reliable process of 0.25 μm rule.

Paper Details

Date Published: 24 July 1996
PDF: 9 pages
Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245241
Show Author Affiliations
Yasuhiro Koizumi, Hitachi, Ltd. (Japan)
Daniel L. Lopez, KLA Instruments Corp. (United States)


Published in SPIE Proceedings Vol. 2793:
Photomask and X-Ray Mask Technology III
Hideo Yoshihara, Editor(s)

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