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Proceedings Paper

Evaluation of the MEBES 4500 reticle writer to commercial requirements of 250-nm design rule IC devices
Author(s): Frank E. Abboud; David W. Alexander; Thomas P. Coleman; Allen Cook; Leonard Gasiorek; Robert J. Naber; Frederick Raymond; Charles A. Sauer
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Paper Abstract

The design rule requirements and error budget allocation for maskmaking have made the mask a critical component in the fabrication of 250 nm design rule IC devices. The MEBES 4500 raster-scan reticle writer was designed to meet the mask requirements for pilot production of this generation of devices. In this paper, we will review the IC device and user requirements that drove the design criteria of the MEBES 4500 system. The architecture of the MEBES 4500 system is described and compared to these design criteria. MEBES 4500 perfonnance results during development, manufacture, and installation are also compared to the commercial requirements of 250 nm design rule ICs.

Paper Details

Date Published: 24 July 1996
PDF: 14 pages
Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245233
Show Author Affiliations
Frank E. Abboud, Etec Systems, Inc. (United States)
David W. Alexander, Etec Systems, Inc. (United States)
Thomas P. Coleman, Etec Systems, Inc. (United States)
Allen Cook, Etec Systems, Inc. (United States)
Leonard Gasiorek, Etec Systems, Inc. (United States)
Robert J. Naber, Etec Systems, Inc. (United States)
Frederick Raymond, Etec Systems, Inc. (United States)
Charles A. Sauer, Etec Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 2793:
Photomask and X-Ray Mask Technology III
Hideo Yoshihara, Editor(s)

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