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Proceedings Paper

Evaluation of light resistance of pellicle membrane in the environment with solvent
Author(s): Toru Shirasaki; Meguru Kashida; Yoshihiro Kubota
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Paper Abstract

The effect of solvent existence in the photolithographic environment on pellicle is studied. Solvent induces photoreaction and affects pellicles when absorptive solvent at exposure light wavelength exists in the photolithographic environment. The photoreaction depends greatly on exposure intensity. Oxide deposition is dominant at weaker intensity and that has a worse influence on pellicles than thickness reduction at strong intensity. It is necessary to keep the concentration of solvent in the photolithographic environment at low level to prevent the photoreaction of solvent.

Paper Details

Date Published: 24 July 1996
PDF: 9 pages
Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245232
Show Author Affiliations
Toru Shirasaki, Shin-Etsu Chemical Co., Ltd. (Japan)
Meguru Kashida, Shin-Etsu Chemical Co., Ltd. (Japan)
Yoshihiro Kubota, Shin-Etsu Chemical Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 2793:
Photomask and X-Ray Mask Technology III
Hideo Yoshihara, Editor(s)

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