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Proceedings Paper

New figure-fracturing algorithm for high-quality variable-shaped e-beam exposure data generation
Author(s): Hiroomi Nakao; Koichi Moriizumi; Kinya Kamiyama; Masayuki Terai; Hisaharu Miwa
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Paper Abstract

We present a new figure fracturing algorithm that partitions each polygon in layout design data into trapezoids for vriab1eshaped EB exposure data generation. In order to improve the dimension accuracy of fabricated mask patterns created using the figure fracturing result, our algorithm has two new effective functions, one for suppressing narrow figure generation and the other for suppressing critical part partition. Furthermore, using a new graph based approach, our algorithm efficiently chooses from all the possible partitioning lines an appropriate set of lines by which optimal figure fracturing is performed. The application results show that the algorithm produces high quality results in a reasonable processing time.

Paper Details

Date Published: 24 July 1996
PDF: 12 pages
Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245230
Show Author Affiliations
Hiroomi Nakao, Mitsubishi Electric Corp. (Japan)
Koichi Moriizumi, Mitsubishi Electric Corp. (Japan)
Kinya Kamiyama, Mitsubishi Electric Corp. (Japan)
Masayuki Terai, Mitsubishi Electric Corp. (Japan)
Hisaharu Miwa, Mitsubishi Electric Corp. (Japan)

Published in SPIE Proceedings Vol. 2793:
Photomask and X-Ray Mask Technology III
Hideo Yoshihara, Editor(s)

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